Major Research Facilities
RF/DC Reactive Magnetron Sputtering with TMP and MFCs
To coat the metal oxide-based composite thin films for Electronic/Energy devices
Thermal Evaporation Coater
To coat the metal electrodes for device applications
Tube Furnace-CVD (Alumina tube, Temperature up to: 1200°C)
To coat the 2D-materials for electronic/energy device applications
Fume hood for wet-synthesis
To synthesize the nanostructured materials using chemical methods
Muffle furnace (Temp: 1050°C ± 2°C), Oven (Temp: 150°C ± 2°C) & Spin Coater
To anneal the as-grow samples to improve the crystallinity/structural properties (using furnace/Oven) and coat the thin films (using spin coater)
Gas Sensor measurement system
To measure the target/toxic gases to develop gas sensor device
Hall measurement system (Ecopia HMS-3000)
To measure the resistivity, carrier concentration, mobility of semiconductors
Tunable Light Source (300-1800 nm)
To use as a light source for photodetector and gas sensor device characteristics
Custom-made probe station with Keysight Source Measurement unit (SMU-B2901A & Programmable Power supply (E3632A)
To measure the I-V, photodetector, and bolometer device measurements
3-D Printer (Creality CR-6 SE model)
To print the device measurement parts and flexible substrates